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| Laboratories |
> All in one < |
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| Laboratory |
comment / setup |
Phone |
Room |
Contact |
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| FMR |
Para- / ferromagnetic resonance (FMR), electron spin resonance (ESR) |
4414 |
MF 065 |
J. Lindner |
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| Greyroom |
UHV evaporation chamber for polycrystalline films |
2092 |
ME 057 |
O. Posth |
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| HR-TEM |
Tecnai F20, High resolution transmission electron microscope (HR-TEM) |
2091 |
ME 054 |
M. Spasova |
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| Maglomat |
Ultrahigh vacuum setup, molecular beam epitaxy |
2953 |
MD 345 |
A. Ney |
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| Quick'n'Dirty |
High vacuum evaporation chamber |
2063 |
MD 345 |
C. Hassel |
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| Cleanroom Farle |
Magnetic force microscopy (AFM/MFM), optical interference lithography |
6892 |
ME 057 |
O. Posth |
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| Cleanroom Lorke |
Secondary Electron Microscope (SEM of AG Farle), e-beam lithography |
2992 |
ME 057 |
N. Reckers |
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Focused Ion Beam |
1665 |
ME 057 |
M. P. Geller |
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| Hall |
Magnetic force microscope (AFM/MFM), polar magnetooptical Kerr-effect (MOKE), Lock-In based magnetoresistance setup |
2092 |
ME 057 |
C. Hassel |
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| XRD |
X-Ray Diffraction (XRD) |
2377 |
ME 324 |
V. Ney |
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| SQUID |
SQUID-Magnetometry, magnetoresistance setup |
2097 |
ME 327 |
M. Spasova |
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| SThM-FMR / XFMR / MOKE |
Spatially resolved FMR, X-ray detected FMR, ex situ MOKE |
4428 |
MF 083 |
K. Ollefs |
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| TEM |
Phillips CM 12 Transmission electron microscopy |
2952 |
MD 341 |
H. Zähres |
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| UHV |
In situ para- / ferromagnetc resonance, electron spin resonance, MOKE, SQUID, molecularbeam epitaxy |
4413 |
MF 066 |
J. Lindner |
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| Chemistry |
Nanoparticle synthesis from the liquid phase |
2370 |
MD 368 |
H. Zähres |
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| Nanoparticle Generator |
Nanoparticle synthesis from the gas phase |
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M. Acet |
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| Bulk sample preparation |
Bulk sample preparation |
2374 |
ME 329 |
M. Acet |
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| High field low temperature setup |
Thermal and transport property measurement unit |
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ME 322 |
M. Acet |
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| Simulation Laboratory |
Object oriented micromagnetic framework (OOMMF) |
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S. Stienen |
