Sample preparation
Precision Ion Polishing System (PIPS)
| Gatan Model 691 with dual ion sources for double sided milling |
|---|
| milling angles between 0° and 10° |
| production of large, clean, electron transparent areas (typical: 1mm²) |
| sample reducable to thicknesses of about 50 +/- 10 nm |
| sible |
| typically used for metallic bulk samples, isolating / semiconducting samples pos |
| max. start thickness: 100 nm |
| preparation under 10-4 mbar Ar vacuum condition |
Focussed Ion Beam (FIB)
FEI Nanolab

