Universität Duisburg-Essen


Equipment


Stem Besser Klein
Electron Microscopy

In our electron microscopy lab we have scanning electron microscopes with acceleration voltages between 0.05 kV and 40 kV and a spatial resolution down to 1.2 nm.
Technical Equipment


Scanning Force Microscopy

Four Scanning Force Microscopes providing a spatial resolution of 10 nm are currently used for the following techniques:
  • Kelvin-Force-Microscopy
  • Scanning Probe Current/Voltage Measurement Technique
  • Magnetic Force Microscopy
  • Conductive-AFM
Technical Equipment
 


Reinraum43
Nanotechnology and Preparation

The institute’s new cleanroom provides a 120 m² lab of the classes 100 and 1000. The cleanroom is equipped with:
  • Electron beam lithography
  • Evaporator, Sputter
  • Mask aligner, Spin Coater
  • Ultra sonic bonder, Vacuum oven
Technical Equipment


Optik  

Time- and Spatially Resolved Optical Spectroscopy

Based on two picosecond/ femtosecond Ti-Saphir-lasers incl. frequency doublers and triplers the dynamic properties of modern materials and devices are investigated in the femtosecond spectroscopy lab. In combination with a streak-camera and a microchannel plate following measurement techniques are used:
  • time resolved
  • Photoluminescence-Spectroscopy time resolved Kerr-Rotation
Technical Equipment


 


Laser1
Micro- and Nanooptic

The core of the micro and nano optic lab are two measurement systems for temperatures between 1.5 K and room temperature. Electrical and magnetic fields up to 5 T could be applied to the systems. Several lasers emitting wavelength between 350 nm and 1 µm are used for the following techniques:
  • high spatial resolved Magneto Optic
  • Micro-Photoluminescence-Spectroscopy
Technical Equipment

Last modified: Tuesday, 1/25/2011
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