Flyer Laboratory for Nanostuctures and Nanoanalysis

Scanning Force Microscopy
We analyze materials and devices with respect to topography and surface roughness, determine local potential and current distributions in micro- and optoelectronic devices and measure magnetic fields and conductivities with a spatial resolution down to the 10 nm range. The following techniques are available:

• Kelvin force microscopy
• Scanning probe current and scanning probe voltage microscopy
• Magnetic force microscopy
• Conductive scanning force microscopy

Technical Equipment

Electron Microscopy
We prepare materials and devices (e.g. metal-semiconductor hybrids, semiconductor heterostructures, nanoparticles, optoelectronic devices) for electron microscopy and scanning transmission electron microscopy. A well equipped preparation lab including metallization, polishing and sawing techniques and ion thinning is available.

Combining conventional electron microscopy and scanning transmission electron microscopy we are able to achieve high resolution images of materials and devices and, in addition, get access to morphology, strain, chemical composition and local crystal structure (e.g. lattice constant) with a spatial resolution of about 1 nm. The following techniques are used in our lab:

• Bright field imaging
• Z-contrast measurements
• Parallel electron energy loss spectroscopy (EELS)
• Convergent beam electron diffraction

Technical Equipment

Time- and Spatially Resolved Optical Spectroscopy
We analyze nanostructures with high spatial (Sub-µm) and temporal (fs/ps-regime) resolution. Besides the analysis of optoelectronics devices we are specialized on the characterization of magnetic semiconductors, ferromagnet-semiconductor hybrids, semiconductor nanostructures and nanoparticles. By time-resolved experiments, characteristic carrier lifetimes, spin lifetimes and scattering time constants of semiconductors, nanostructures and devices can be determined. We can offer the following techniques:

• Highly spatially resolved magneto-optics
• Micro-photoluminescence spectroscopy
• Time-resolved photoluminescence spectroscopy
• Time-resolved Kerr rotation

Technical Equipment

Nanotechnology and Preparation
In our newly established clean room (120 m2, class 100 and 1000), a variety of nanotechnological equipment is available. Lateral nanostructures with sizes down to 20 nm can be achieved. The following techniques are used:

• Electron beam lithography
• Optical lithography
• Metallization using thin film techniques
• Wet chemical etching and semiconductor processing
• Contact technology with ultrasonic bonders

Mainly compound semiconductors and metal-semiconductor hybrids are processed

Technical Equipment