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Die folgenden Publikationen sind in der Online-Universitätsbibliographie der Universität Duisburg-Essen verzeichnet. Weitere Informationen finden Sie gegebenenfalls auch auf den persönlichen Webseiten der Person.
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Computational fluid dynamics based stochastic aerosol modeling : Combination of a cell-based weighted random walk method and a constant-number Monte-Carlo method for aerosol dynamicsIn: Chemical Engineering Science, 2012, Nr. 70, S. 109 – 120
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Classification of highly monodisperse nanoparticles of NIST-traceable sizes by TDMA and control of deposition spot size on a surface by electrophoresisIn: Journal of Aerosol Science, Jg. 39, 2008, Nr. 6, S. 537 – 548
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Controlled Deposition of SiO2 Nanoparticles of NIST-Traceable Particle Sizes for Mask Surface Inspection System CharacterizationIn: IEEE Transactions on Semiconductor Manufacturing, Jg. 21, 2008, Nr. 2, S. 238 – 243
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Experimental Investigations of Protection Schemes for Extreme Ultraviolet Lithography Masks in Carrier Systems Against Horizontal Aerosol FlowIn: IEEE Transactions on Semiconductor Manufacturing, Jg. 20, 2007, Nr. 2, S. 176 – 185
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Numerical Evaluation of Protection Schemes for EUVL Masks in Carrier Systems Against Horizontal Aerosol FlowIn: Journal of the Electrochemical Society (JES), Jg. 154, 2007, Nr. 3, S. H170 – H176
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Modelling of Physical Processes during Dispersion of Nanoparticles from a LeakIn: European Aerosol Conference 2008 / European Aerosol Conference 2008: 24-29 August 2008, Thessaloniki, Greece, 2008, S. T01A023O
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Particle Deposition on Two Parallel, Horizontal Plates under the Influence of Thermophoresis and ElectrophoresisIn: 7th International Aerosol Conference / IAC 2006, September 10-15 2006,St. Paul, Minnesota USA, 2006, S. 764 – 765
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Basic Solutions for Nanoparticle Contamination in EUV-LithographyIn: Nanofair 2005: New Ideas for Industry / 4th International Nanotechnology Symposium, November 29 - 30, 2005, Dresden. Düsseldorf: VDI Verlag, 2005, S. 11 – 14
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Modeling of Nanoparticle Contamination on Critical Surfaces in Semiconductor IndustryIn: EAC 2005: European Aerosol Conference 2005 : 28. August - 2.September 2005, Ghent, Belgium / European Aerosol Conference (EAC), 28. August - 2.September 2005, Ghent, Belgium. Gent: Universiteit Gent, 2005, S. 631