Ruđer Bošković Institute


The team led by Marko Karlušić will undertake irradiations with ions of low kinetic energy < 1 MeV/u, as well as etching of the test samples immediately after irradiation (WP1). In particular, two specific contributions of the RBI team will be low energy ion irradiation targeting nanomembrane development (WP1, WP4) and advanced irradiation concepts based on the use of swift heavy ion microbeam for ion lithography and single ion irradiation (WP4). Contribution to modelling (WP3) is also foreseen.