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Professor/in, Technische Physik
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Die folgenden Publikationen sind in der Online-Universitätsbibliographie der Universität Duisburg-Essen verzeichnet. Weitere Informationen finden Sie gegebenenfalls auch auf den persönlichen Webseiten der Person.
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Crystallization and conductivity of large-domain Nb-doped TiO₂ films prepared by electron beam evaporationIn: Thin Solid Films Jg. 754 (2022)ISSN: 0040-6090; 1879-2731Online Volltext: dx.doi.org/
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Effects of different amounts of nb doping on electrical, optical and structural properties in sputtered tio₂−ₓ filmsIn: Crystals Jg. 11 (2021) Nr. 3,ISSN: 2073-4352Online Volltext: dx.doi.org/ (Open Access)
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Line defects in crystals and flux pinning in superconductors Scientific work of Reiner Labusch (1935 - 2016)
18th International Conference on Extended Defects in Semiconductors, EDS 2016, 25-29 September 2016, Saint Aygulf, France,In: Materials Today: Proceedings Jg. 5 (2018) Nr. 6, S. 14662 - 14692ISSN: 2214-7853Online Volltext: dx.doi.org/ -
Spectral decomposition of Raman spectra of mixed-phase TiO₂ thin films on Si and silicate substratesIn: Journal of Raman Spectroscopy Jg. 49 (2018) Nr. 7, S. 1217 - 1229ISSN: 1097-4555; 0377-0486Online Volltext: dx.doi.org/
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Influence of thickness on the structural properties of radio-frequency and direct-current magnetron sputtered TiO2 anatase thin filmsIn: Thin Solid Films Jg. 558 (2014) S. 443 - 448ISSN: 0040-6090Online Volltext: dx.doi.org/
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Structural and electrical properties of Nb-doped TiO₂ films sputtered with plasma emission controlIn: Thin Solid Films Jg. 568 (2014) Nr. 1, S. 94 - 101ISSN: 0040-6090Online Volltext: dx.doi.org/
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Thickness dependence of the growth of magnetron-sputtered TiO₂ films studied by Raman and optical transmittance spectroscopyIn: Journal of Applied Physics Jg. 114 (2013) Nr. 1,ISSN: 0021-8979; 1089-7550Online Volltext: dx.doi.org/
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All-optical tunability of microdisk lasers via photo-adressable polyelectrolyte functionalizationIn: Optics Express Jg. 20 (2012) Nr. 6, S. 6060 - 6067ISSN: 1094-4087Online Volltext: dx.doi.org/ (Open Access)
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Keimbildung und Wachstum von TiO2 in dünnen Schichten : Bombardierung erzeugt Rutil-Keime; bei 250°C entstehen große Anatas-KörnerIn: Vakuum in Forschung und Praxis: Zeitschrift für Vakuumtechnologie, Oberflächen und Dünne Schichten Jg. 23 (2011) Nr. 1, S. 20 - 23ISSN: 1522-2454; 0947-076XOnline Volltext: dx.doi.org/
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Density and refractive index of thin evaporated filmsIn: Chinese Optics Letters Jg. 8 (2010) Nr. Suppl., S. 67 - 72ISSN: 1671-7694Online Volltext: dx.doi.org/
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Dielectric modeling of transmittance and ellipsometric spectra of thin In ₂O ₃ : Sn filmsIn: Physica Status Solidi (A) Applications and Materials Science Jg. 207 (2010) Nr. 7, S. 1543 - 1548ISSN: 1862-6319Online Volltext: dx.doi.org/
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Post-heatig of SiO2 films for optical coatingsIn: Thin Solid Films Jg. 516 (2008) Nr. 23, S. 8749 - 8751ISSN: 0040-6090
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Residual Based Localisation and Quantification of Peaks in X-Ray Diffractograms.In: Annals of Applied Statistics, 2 (2008) S. 861 - 886
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Frequency and temperature-dependent dielectric properties of BaTiO3 thin film capacitors studied by complex impedance spectroscopyIn: Physica B: Condensed Matter Jg. 391 (2007) Nr. 2, S. 212 - 221ISSN: 0921-4526
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Structural investigation of thin TiO2 films prepared by evaporation and post-heatingIn: Thin Solid Films Jg. 515 (2007) Nr. 17, S. 6904 - 6908ISSN: 0040-6090
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Impedance spectroscopy study of RuO2/SrTiO3 thin film capacitors prepared by radio-frequency magnetron sputteringIn: Materials Science and Engineering: B Jg. 130 (2006) Nr. 1-3, S. 237 - 245ISSN: 0921-5107
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Structural and electrical properties of RuO2 thin films prepared by rf-magnetron sputtering and annealing at different temperaturesIn: Journal of Materials Science: Materials in Electronics Jg. 17 (2006) Nr. 12, S. 1029 - 1034ISSN: 1573-482X; 0957-4522
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Structural and optical properties of BaTiO3 thin films prepared by radio-frequency magnetron sputtering at various substrate temperaturesIn: Journal of Physics D: Applied Physics Jg. 39 (2006) Nr. 6, S. 1161 - 1168ISSN: 0022-3727; 1361-6463Online Volltext: dx.doi.org/
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Refractive index of thin films of SiO2, ZrO2, and HfO2 as a function of the films' mass densityIn: Applied Optics Jg. 44 (2005) Nr. 15, S. 3006 - 3012ISSN: 0003-6935; 1539-4522
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Structural and electrical properties of In2O3 : Sn films prepared by radio-frequency sputteringIn: Thin Solid Films Jg. 392 (2001) Nr. 1, S. 91 - 97ISSN: 0040-6090; 1879-2731Online Volltext: dx.doi.org/