Equipment

The Schleberger group operates a variety of UHV-setups with in situ surface preparation techniques such as heating, sputtering, ovens for epitaxy and deposition of molecules. In addition, various instruments for sample preparation are in operation, e.g. ovens for chemical vapor deposition. For sample analysis we use in addition a number of complementary methods such as scanning probe microscopy, confocal Raman and photoluminescence imaging/spectroscopy, and X-ray photoelectron spectroscopy.

Raman/PL-microscope:

• WiTec Raman/PL/AFM with 457 nm, 532 nm, and 633 nm lasers

Scanning probe microscopes:

• Veeco Dimension 3100 (ambient conditions, together with AG Horn von Hoegen)
• Omicron RT-STM/AFM UHV with RHK SPM-1000 & PLL Pro2
• Omicron VT-STM/AFM UHV with Matrix controller
• RHK VT-AFM UHV 750 with R9 controller and optical access for micron-sized samples

Spectroscopy:

• MCP LEED and standard LEED
• Spectra and Phi X-ray sources
• Staib DESA-100 and PHI 500 electron spectrometer for AES and XPS

Beamlines for highly charged ions:

• UHV-setup equipped with Dresden EBIS ion source for the production of highly charged ions up to E_pot = 66 keV, e.g. Xe⁴⁶⁺, charge state separation, deccelaration stage (1 keV*q), ToF-analysis and VUV-laser for post-ionization
• Dresden EBIT ion source for the production of highly charged ions up to E_pot = 45 keV, e.g. Xe⁴²⁺ mounted to a UHV scanning probe microscope for in-situ analysis of HCI induced defects

Experiments with swift heavy ions are conducted at the

• GANIL/CIMAP in France (IRRSUD, SME, ARIBE) in collaboration with H. Lebius
• GSI in Darmstadt (permanent STM/AFM setup at the M-branch) 
• RBI in Croatia in collaboration with M. Karlusic

HICS setup consisting of 1: EBIT, 2: Extraction system, 3: Magnet, 6: Irradiation chamber