SEM Zeiss
Scanning electron microscopy (SEM)
Zeiss LEO 1530
- Field emission gun (FEG)
- Up to 30 kV acceleration voltage
- Water-cooled lens
- Lateral resolution 1.2nm
- Pressure at sample: 10-6 mbar
- Max. sample size: lateral 50 mm
Detectors
- In-lens detector
- SE2 secondary electron detector
- Robinson backscatter detector
- Structural investigations with Oxford Instruments Nordlys EBSD detector
- Chemical composition determination with Oxford Instruments XMAX 80mm² EDX detector
Contact:
U. Wiedwald
D. Spoddig
Electron beam lithography (EBL)
Raith ELPHY Plus system
- Min. linewidth of 25nm
- Max write field size 4000²µm²
- Step size: 3nm @ 200µm
- Various positive/negative e-beam resists
- Resists with thicknesses up to 600nm